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TiN/Gd:HfO2/TiN capacitor

Based on

1 Articles
2016 Most recent source

Composition

1

p-doped silicon

p-doped Si
Type Complex Compound
Formula
Role substrate
2

titanium nitride

Type Single Compound
Formula TiN
Role electrodes
3

gadolinium-doped hafnium oxide thin film

Gd:HfO2 thin film
Type Nano Material
Formula
Role dielectric layer
4

titanium

Type Single Compound
Formula Ti
Role adhesion layer
5

platinum

Type Single Compound
Formula Pt
Role contacts

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
charge of ferroelectric

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Applications

Area Application Nanomaterial Variant Source
electronics

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Characterization

Method Nanomaterial Variant Source
transmission electron microscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • p-doped silicon
  • titanium nitride
Product

TiN/Gd:HfO2/TiN capacitor

Size: not specified

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • titanium nitride
  • p-doped silicon
Product

TiN/Gd:HfO2/TiN capacitor

Size: not specified

Medium/Support: none

References

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