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DWCNT thin film transistor

Based on

1 Articles
2015 Most recent source

Composition

1

highly n-doped silicon

Type Complex Compound
Formula
Role back-gated substrate
2

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role gate dielectrics
3

DWCNT thin film

Type Nano Material
Formula
Role conducting channel
4

chromium

Type Single Compound
Formula Cr
Role adhesion layer
5

gold

Type Single Compound
Formula Au
Role source
6

gold

Type Single Compound
Formula Au
Role drain
7

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role protected layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
breakdown power

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Applications

Area Application Nanomaterial Variant Source
electronics

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Characterization

Method Nanomaterial Variant Source
Raman spectroscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
Product

DWCNT thin film transistor

Size: not specified

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
Product

DWCNT thin film transistor

Size: not specified

Medium/Support: none

Method 3

Type: Physical formation
Source:
Starting materials
Product

DWCNT thin film transistor

Size: not specified

Medium/Support: none

Method 4

Type: Physical formation
Source:
Starting materials
Product

DWCNT thin film transistor

Size: not specified

Medium/Support: none

Method 5

Type: Physical formation
Source:
Starting materials
Product

DWCNT thin film transistor

Size: not specified

Medium/Support: none

References

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