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WSe2-based F4TCNQ-doped pMOS/AlOx-encapsulated nMOS field effect transistor

Based on

1 Articles
2015 Most recent source

Composition

1

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role substrate
2

chromium

Type Single Compound
Formula Cr
Role gate
3

gold

Type Single Compound
Formula Au
Role gate
4

palladium

Type Single Compound
Formula Pd
Role gate
5

aluminium oxide

aluminum oxide alumina
Type Single Compound
Formula Al2O3
Role gate dielectrics
6

tungsten diselenide nanoflakes

WSe2 nanoflakes WSe2 flakes
Type Nano Material
Formula
Role channels
7

platinum/gold

Pt/Au
Type
Formula
Role
8

silver/gold

Ag/Au
Type
Formula
Role
9

2,3,5,6-tetrafluoro-7,7,8,8,-tetracyanoquinodimethane

2,3,5,6-tetrafluoro-7,7,8,8-tetracyanoquinodimethane 7,7,8,8-tetracyano-2,3,5,6-tetrafluoroquinodimethane tetrafluoro-7,7,8,8-tetracyanoquinodimethane tetrafluoro-tetracyano-quinodimethane tetrafluoro tetracyanoquinodimethane tetrafluoro-tetracyanoquinodimethane F4-TCNQ F4-TCNQ F4TCNQ F4TCNQ
Type
Formula C12F4N4
Role
10

substoichiometric aluminum oxide

noncrystalline aluminum oxide anodized aluminum oxide aluminium suboxide oxidized aluminium aluminium oxide aluminum oxide alumina
Type
Formula AlO(x)
Role

Properties

General physical and chemical properties

Property Value Source
drain current

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Applications

Area Application Source
power generation

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Characterization

Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • silicon dioxide
  • gold
  • palladium
See all (4)
Product

WSe2-based F4TCNQ-doped pMOS/AlOx-encapsulated nMOS field effect transistor

References

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