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CH3NH3PbI3-xClx based device

Based on

1 Articles
2015 Most recent source

Composition

1

fluorine doped tin oxide

fluorine doped tin oxide SnO2:F SnO2:F FTO
Type Complex Compound
Formula
Role substrate
2

titanium(IV) oxide

titanium dioxide titanium oxide titania
Type
Formula TiO2
Role
3

CH3NH3PbI3-xClx film

Type
Formula
Role
4

spiro-OMeTAD/4-tert-butylpyridine/LiTFSI/FK102

Type Complex Compound
Formula
Role hole transport layer
5

gold

Type Single Compound
Formula Au
Role back contact

Properties

General physical and chemical properties

Property Value Source
band gap

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Applications

Area Application Source
power generation

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Characterization

Method Source
dielectric spectroscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • fluorine doped tin oxide
  1. sEM8yBhGGn
  2. PAplZPAzi8
Product

CH3NH3PbI3-xClx based device

Method 2

Type: Physical formation
Source:
Starting materials
  • fluorine doped tin oxide
  1. y4j6ZpgvuX
  2. XA9POXZCH3
Product

CH3NH3PbI3-xClx based device

References

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