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amorphous hafnium-indium-zinc oxide thin film transistor

Based on

1 Articles
2012 Most recent source

Composition

1

soda-lime-silica glass

soda-lime glass glass
Type Complex Compound
Formula
Role substrate
2

aluminium

aluminum
Type Single Compound
Formula Al
Role gate
3

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role insulating layer
4

hafnium indium zinc oxide

Type Single Compound
Formula Zn5.21In14.98Hf22.69O57.13
Role active layer
5

gold

Type Single Compound
Formula Au
Role source
6

gold

Type Single Compound
Formula Au
Role drain

Properties

General physical and chemical properties

Property Value Source
drain current

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Applications

Area Application Source
electronics

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Characterization

Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • soda-lime-silica glass
  • aluminium
Product

amorphous hafnium-indium-zinc oxide thin film transistor

References

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