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hydrogenated amorphous silicon-based photoreceptor with multilayer blocking structure

Based on

1 Patents
2013 Most recent source

Composition

1

narrow/wide gap doped semiconductor stack

Type Nano Material
Formula
Role blocking layer
2

hydrogenated amorphous silicon

a-Si:H
Type Complex Compound
Formula
Role photoconductive layer
3

silicon-rich silicon nitride

Si-reached silicon nitride silicon nitride a-SiNx SRSN
Type Single Compound
Formula SiN(x)
Role surface layer

Properties

Applications

Area Application Nanomaterial Variant Source
electronics

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Characterization

Biological effects

Preparation

References

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