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SiO2-based metal-insulator-semiconductor device

Based on

1 Articles
2011 Most recent source

Composition

1

p-type silicon

Type
Formula
Role
2

silica layer embedding silicon nanoclusters

Si nanoclusters embedded in SiO2 film SiO2 layer embedding Sinc
Type
Formula
Role
3

aluminium

aluminum
Type
Formula Al
Role

Properties

General physical and chemical properties

Property Value Source
current density

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Applications

Area Application Source
electronics

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Characterization

Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • silicon dioxide
  • p-type silicon
  1. 6d2FfKGAnO0D8aixDO9BDLjzuqwp3
Product

SiO2-based metal-insulator-semiconductor device

References

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