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asymmetric ZrCuAlNi/ZrO2+aluminum oxide phosphate/Al metal-insulator-metal diode

Based on

1 Articles
2011 Most recent source

Composition

1

200 nm thick ZrCuAlNi amorphous metal layer

Type
Formula
Role
2

1.5 nm thick ZrCuAlNi amorphous metal native oxide layer

Type
Formula
Role
3

aluminum oxide phosphate

Type
Formula
Role
4

aluminium

aluminum
Type
Formula Al
Role

Properties

General physical and chemical properties

Property Value Source
current density dependent on aluminium oxide layer thickness

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Applications

Characterization

Biological effects

Preparation

References

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