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NbN/GdN/NbN films grown on MgO-precoated oxidized Si substrate

Based on

1 Articles
2013 Most recent source

Composition

1

oxidized silicon

Type Complex Compound
Formula
Role substrate
2

magnesium oxide

magnesia
Type Single Compound
Formula MgO
Role etch-stop layer
3

niobium(III) nitride

niobium nitride
Type Single Compound
Formula NbN
Role electrodes
4

gadolinium nitride

Type Single Compound
Formula GdN
Role barrier layer
5

niobium(III) nitride

niobium nitride
Type Single Compound
Formula NbN
Role electrodes

Properties

General physical and chemical properties

Property Value Source
conduction band exchange splitting

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Applications

Area Application Source
electronics

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Characterization

Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • magnesium oxide
  • oxidized silicon
Product

NbN/GdN/NbN films grown on MgO-precoated oxidized Si substrate

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • magnesium oxide
  • oxidized silicon
Product

NbN/GdN/NbN films grown on MgO-precoated oxidized Si substrate

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • magnesium oxide
  • oxidized silicon
Product

NbN/GdN/NbN films grown on MgO-precoated oxidized Si substrate

References

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