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example of semiconductor device with high quality crystal structure

Based on

1 Patents
2012 Most recent source

Composition

1

silicon

Type Single Compound
Formula Si
Role substrate
2

indium gallium nitride

InGaN
Type Complex Compound
Formula
Role semiconductor layer
3

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role mask layer
4

gallium nitride

Type Single Compound
Formula GaN
Role semiconductor layer

Properties

Applications

Area Application Source
electronics

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Characterization

Biological effects

Preparation

References

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